Molecular Vapor Deposition
Introduction
There has been much new advancement in the nano-technology field on a international level in recent years. The new advancements have drawn a increasing interest in nanometer scale surface coating. Ultra thin film coatings can be used in a wide range of applications as lubricants, anti-stiction layers, molecular glues, coupling agents or adhesion layers. The mentioned molecular coatings are used to modify material surface properties. The traditional coating deposition methods consist of a set of sequential wet baths. The wet processing method is complex and limits the ability of molecular coating in many MEMS applications. The use of liquid precursors has extremely limited bath life, which cause the method to be highly expensive and have low product ability. In this paper a new surface coating technique a new surface coating technique will be discussed, which is called Molecular Vapor Deposition (MVD). This new method has proven to overcome the shortcomings of the liquid phase method and has single handedly improved changed the ability of surface coatings.
Molecular Vapor Deposition (MVD) is a unique nanotechnology technique that allows for room temperature vapor deposition of organic and organometallic molecules. MVD technology enables the growth of ultra-thin films with a wide range of functionality on a broad spectrum of substrates. This innovative technique has allowed many new emerging applications with small feature sizes that where very difficult or impossible to produce using traditional liquid synthetic techniques. MVD is very versatile and is an ideal process for modifying surface properties. Films that are created using MVD can serve as hydrophobic, hydrophilic, biocompatible, protective, or reactive coatings. The MVD process takes place in a vacuum and when it is combined with Applied MicroStructures advanced surface preparation and adhesion enhancement techniques, the extent of surface coverage and coating conformability
There has been much new advancement in the nano-technology field on a international level in recent years. The new advancements have drawn a increasing interest in nanometer scale surface coating. Ultra thin film coatings can be used in a wide range of applications as lubricants, anti-stiction layers, molecular glues, coupling agents or adhesion layers. The mentioned molecular coatings are used to modify material surface properties. The traditional coating deposition methods consist of a set of sequential wet baths. The wet processing method is complex and limits the ability of molecular coating in many MEMS applications. The use of liquid precursors has extremely limited bath life, which cause the method to be highly expensive and have low product ability. In this paper a new surface coating technique a new surface coating technique will be discussed, which is called Molecular Vapor Deposition (MVD). This new method has proven to overcome the shortcomings of the liquid phase method and has single handedly improved changed the ability of surface coatings.
Molecular Vapor Deposition (MVD) is a unique nanotechnology technique that allows for room temperature vapor deposition of organic and organometallic molecules. MVD technology enables the growth of ultra-thin films with a wide range of functionality on a broad spectrum of substrates. This innovative technique has allowed many new emerging applications with small feature sizes that where very difficult or impossible to produce using traditional liquid synthetic techniques. MVD is very versatile and is an ideal process for modifying surface properties. Films that are created using MVD can serve as hydrophobic, hydrophilic, biocompatible, protective, or reactive coatings. The MVD process takes place in a vacuum and when it is combined with Applied MicroStructures advanced surface preparation and adhesion enhancement techniques, the extent of surface coverage and coating conformability
References: Applied MST. 20 April 2009. Applied Microstructures Inc. 1 January 2008 TEXMEMS.ORG. 20 April 2009. TEXMEMS.org 1 January 2005 http://www.texmems.org/TEXMEMS_IX_Abstract_files/Helmrich.pdf World Class MEMS Innovation. 22 April 2009. Infotonics Technology Center. 1 January 2009 < http://www.itcmems.com/pdfs/presentations/molevularDepositionManufacturing.pdf> NanoWerk 22 April 2009. NanoWerk LLC. 1 January 2009. < http://www.nanowerk.com/nanotechnology/introduction/introduction_to_nanotechnology_23.html> Center for Resposible Nanotechnology. 23 April 2009. CCN. 1 January 2009. < http://www.crnano.org/interview.chinn.htm>